F00500 - SEMI F5 - Guide for Gaseous Effluent Handling Revision:SEMI F5-1101 - Inactive 2 Although it was developed

2  Although it was developed primarily for use in calibration of SSISs to be used for detection of LLSs on polished silicon wafers with geometrical characteristics as specified in SEMI M1

The detection range of the method described is between 0

wafers may be further processed following testing by this Test Method

since it is subject to the agreement between the individual parties of the mask qualification process

previously published March 2005

F00500 - SEMI F5 - Guide for Gaseous Effluent Handling Revision:SEMI F5-1101 - Inactive 2 Although it was developedNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This document, as balloted, is intended to replace SEMI F5 90 in its entirety. NOTICE: Paragraphs entitled "NOTE" are not an official part of this guide and are not intended to modify or supersede the official