Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US Al

Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US AlFeatures: A plane (11 20) sapphire wafer is being used extensively as a substrate for III V nitrides and magnetic epitaxial films due to its better lattice mismatch Wafer size: 3" dia x 0. 5 mm thickness Orientaion: A plane <11 20> ori.(+ 05o) with Standard Flat Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical

we can modify your tube furnace into evaporating coater

8Normal0 Aiming to replace of the traditional PVDF binder

Net Weight: 320mg/pcs

Center hole 1

3% Density > 3

3% Storage and Handling: Powder in bottle covered by vacuum Al bag Non-harzard product 1 year shelf life if under 38

Width: 300mm

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Kerr's Research Group from the Lawrence Berkeley National Laboratory (LBL)

Two pushing rods highly polished and perfectly fitted into die

Fabrication Method: Electrodeposition of Silver on Nickel Foam Substrate

Make sure to inspect for defect(s) thoroughly before use