Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) N-type, R:1-20 ohm.cm - FmAlonSiPa101D0525C1FT3umR1 Spin Coaters It can seal air-sensitive samples

It can seal air-sensitive samples inside the glovebox and transport the sample to the outside glovebox through an antechamber or seals the sample from the outside glovebox by vacuum pump to put it into the glovebox through the antechamber air chamber

3" (60mm)  (+/-1°C)

Made of SS304 stainless steel

Polished surface:   One sideEPI polished via a special CMP procedure

Polished:       Two  sides polished

Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) N-type, R:1-20 ohm.cm - FmAlonSiPa101D0525C1FT3umR1 Spin Coaters It can seal air-sensitive samplesAluminum Metallic Film Film coated by E beam evaporation under vacuum below 10 6 torr evaporation rate: 0. 2 nanometer per second Aluminum Thickness: 3 microns Film Resistivity: 2. 65 micro ohm cm Film Crystallinity: Weak (111) oriented polycrystals Roughness, RMS: 4. 87 nm and < 10 nm Silicon Wafer Specifications: Conductive type: Si n type Resistivity: 1 10 ohm cm Size: 4" diameter + 0. 5 mm x 0. 525 + 0. 025 mm th Orientation: (100) + 0. 5o Polish: