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Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer Ingestion-build-48068 Contents of BS ISO 8789:
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Description
Contents of BS ISO 8789:
Matters not related to structural integrity
BS 8519 does not give recommendations for those installations covered in BS 5839-1
Who is ISO 12900 —Abrasiveness of hard coal for
such that the operational and functional integrity of the overall pipework system is maintained
Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer Ingestion-build-48068 Contents of BS ISO 8789:1 Scope This Technical Report describes a method for determining ion sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X ray photoelectron spectroscopy (XPS) where the specimen is ion sputtered over a region with an area between 0,4 mm2 and 3,0 mm2. This Technical Report is applicable only to a laterally homogeneous bulk or single layered material where the ion sputtering rate is determined from the sputtered
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