Undoped AlN Template on Silicon ( Si <111> P type ) 10mmx10mm x 200 nm - FmAlNonSiBc101005S1FT200nm SrTiO3 or explosive materials

or explosive materials

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6 Mpa Elongation > 330 % Compression Ratio < 500 Molecular Mass About 6 million Property General Purpose Resin

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Undoped AlN Template on Silicon ( Si <111> P type ) 10mmx10mm x 200 nm - FmAlNonSiBc101005S1FT200nm SrTiO3 or explosive materialsAlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrate. Specifications Useful area: 90% Nominal AlN thickness: 200nm 10%, one side coated, undoped AlN film Front Surface: <1nm RMS, as grown Back surface: silicon as received AlN orientation: c plane (00. 1) Macro Defect Density: <1 cm^2 Wafer base: Silicon [111] P type, 10x10 x0. 5 mm, one side polished