Al2O3- Sapphire Wafer, M Plane, 2"Dia x0.5mm, 2SP - ALM50D05C2 Orientation 100

Al2O3- Sapphire Wafer, M Plane, 2"Dia x0.5mm, 2SP - ALM50D05C2 Orientation 100Features: M <10 10> ori. sapphire wafer is being used extensively as a substrate for III V nitrides and magnetic epitaxial films due to its better lattice mismatch Wafer size: 2" dia x 0. 5 mm thickness Orientaion: M plane <10 10>orn + 0. 5 Deg Polished surface: Wafer surface is EPI polished via a special CMP procedure. Price listed here is for one side polished Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with

04    (74

Feedthrough ( optional) You may need KF40 feedthrough to put heater inside the vacuum chamber

Orientation <111> +/- 2 o

4  Vacuum level 10 -6 torr via suitable turbo pump

005  ohm-cm

20 containers per shipment ( please kindly don't ask to order less than 20 pcs

Features High precision cutting for hard and brittle nonmetal materials such as Si

M plane orientation

Temperature range: -40° C to +90° C

Whole set  pressing die includes Double layer structure 120mm dry pressing die

the glove box can be vacuumed by a mechanical pump up to 0

91 Array (Capacity):    5*8=40